X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis D.D. Chung

ISBN: 9780471187264

Published: February 26th 1993

Hardcover

268 pages


Description

X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis  by  D.D. Chung

X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis by D.D. Chung
February 26th 1993 | Hardcover | PDF, EPUB, FB2, DjVu, audiobook, mp3, ZIP | 268 pages | ISBN: 9780471187264 | 4.44 Mb

In light of the growing importance and availability of intense x-ray sources and position-sensitive detectors, this book offers comprehensive treatment of the principles, instrumentation, and applications of x-ray diffraction at elevated temperatures.

Coverage explores the uses of intense x-ray sources and position-sensitive detectors for assessing these sources, and offers comparisons with complementary thermal analysis techniques (differential scanning calorimetry, thermogravimetric analysis, thermal mechanical analysis) for carrying out phase identification, texture analysis, and grain size measurement by way of in situ process analysis at elevated temperatures in a broad range of fields, including crystallography, thermal analysis, materials science, chemical and electrical analysis.



Enter the sum





Related Archive Books



Related Books


Comments

Comments for "X-Ray Diffraction at Elevated Temperatures: A Method for in Situ Process Analysis":


artsyfran.com

©2011-2015 | DMCA | Contact us